Wednesday, February 5, 2014

Ee2072 L226 Semiconductors

Content 1.ObjectivePage 2 2.Equipment and Components 2 3.Introduction 3 4.Four-Point examine 4 4.1Theory 4 4.2 prove 7 4.2.1Four-Point Probe Station 4.2.2Four-Point Probe measurement 4.2.3Discussion 5. dorm Effect 11 5.1Theory 5.2Experiment 5.2.1 foyer Effect Measurement 5.2.2Discussion 6.Advantages and Disadvantages 15 6.1Four-point probes measurement 6.2Hall effect measurement 7.Photoconductivity of Light dependent Resitor (LDR) 16 1. Theory 2. Experiment 8.Conclusion 20 9.Appendix 21 1Objective The objectives of the essay are: a) development the four-point probe technique to forge the resistivity, impureness concentration and crew cut wave mobility of silicon en adjudicates. b) Using Hall effect measurement to determine the dopant/carrier type, Hall coefficient, carrier concentration, conductivity and carrier mobility of germanium samples. c) To study the photoconductivity of a Light Dependent resistivity (LDR) 2Equipment and components Four-point probe station Electromagnet digital gaussmeter Source measurement unit Digital multimeter DC power supply Silicon wafers (x2) Mounted germanium samples (x2) 3 Introduction Electrical characterization of worldlys evolved in three levels of understanding. In the proto(prenominal) 1800s, the resistance R and conductance G were treated as metrical physical quantities obtainable from two-terminal I-V measurements (i.e. current I, voltage V). Different sample shapes gave different resistance values. This led to the understanding (second level) that an intrinsic corporeal property like resistivity (or conductivity) is...If you want to get a full essay, order it on ou! r website:

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